The New U.S. Patent Law: What You Need to Know and How It Will Affect Your Strategy

Here is a presentation recently given to the SPIE Advanced Lithography Symposium in San Jose.


In "The New U.S. Patent Law: What You Need to Know and How It Will Affect Your Strategy," Charles Szmanda describes the most important aspects of the new patent law. These include: (1) the "first inventor to file" system, which takes effect on March 16, 2013 and replaces the "first to invent" system in current law; (2) new ways to challenge issued patents such as "Post Grant Review" and "Inter Partes" review; (3) prior art submission during prosecution of another inventor's patent application; (4) prioritized examination of applications; and (5) prior user rights. He also discusses how these new elements of the law will alter the competitive environment but will also present a number of opportunities for formulating a successful patent strategy within that new environment.

If you don't see the presentation on the screen, you can see it here:  http://spie.org/app/spietv/default.aspx?video=2202956471001